You can control and modify feature patterns in the following ways:
Use the Geometry pattern option to make exact patterned and mirrored copies of features, and to improve system performance when using patterned and mirrored features.
Use the Vary sketch option to adjust the profile of the patterned feature based on its dimensions and relations to other features.
Use a mathematical Equation to calculate values that define the pattern.
Use edit Seed Feature to modify the original feature of a pattern or mirrored feature based on a single feature.
Use Delete Pattern Instances to remove selected instances in a pattern.
Modify the Curve method and the Alignment method when applying curve-driven patterns.
Pattern instances inherit the visual properties of the original feature when you select Propagate Visual Properties in the PropertyManager.